New desk-sized ultraviolet light source tool brings China closer to chip self-reliance

Chinese researchers have developed a new desktop-sized extreme ultraviolet (EUV) lithography light source capable of producing 14-nanometre microchips. Unlike traditional ASML EUV machines, which are large, power-intensive, and rely on complex laser-produced plasma (LPP) systems with tin droplets and massive collector mirrors, this new device uses high-harmonic generation (HHG) by firing a femtosecond laser into argon gas. This approach eliminates the need for giant mirrors and tin droplets, resulting in a dramatically simpler, smaller, and more energy-efficient system that consumes about 1 microwatt per blast—far less than the 200 watts required by ASML machines. While it cannot support mass production of advanced chips, it is well-suited for small-batch fabrication, chip inspection, photomask defect detection, and quantum chip prototyping. The new technology represents a significant step toward China’s goal of self-reliance in high-end chipmaking tools amid restrictions on